Precursors for Deposition of Strontium Bismuth Tantalate Films by Direct Liquid Injection-Metallorganic Chemical Vapor Deposition

Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films

Smooth and continuous films of nickel nitride (NiNx) with excellent step coverage were deposited from a novel nickel amidinate precursor, Ni(MeC(NBu)2)2, and either ammonia (NH3) or amixture of NH3 and hydrogen (H2) gases as co-reactants. The reactants were injected together in direct-liquidinjection chemical vapor deposition (DLI-CVD) processes at substrate temperatures of 160-200 C. Depending...

SiC coatings grown by liquid injection chemical vapor deposition using single source metal-organic precursors

Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition

Bismuth titanate (Bi,Ti,O,, :BIT) thin films were prepared on the Pt courted MgO(100) substrate by electron cyclotron resonance plasma sputtering-chemical vapor deposition (ECR plasma sputtering-CVD). Bi20, was used as a sputtering target and tetra-isopropoxy-titanium [Ti(i-C3H70)4] as a CVD source. The composition of films was controlled by changing RF power (P,,) of Bi,O, target and Ti source...

Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films

By a direct-liquid-evaporation chemical vapor deposition (DLE-CVD) method, we deposited smooth lowresistance cobalt (Co) and cobalt nitride (CoxN) thin films with excellent conformality at low temperatures down to 200 1C. In the DLE process, a cobalt amidinate precursor solution, bis(N,N0-diisopropylacetamidinato)cobalt(II) dissolved in tetradecane, was vaporized as it flowed smoothly, without ...

Volatile Precursors for Films Deposition: Vapor Pressure, Structure and Thermodynamics

At present the processes of chemical vapour deposition (MO CVD) and physical vapour deposition (PVD) are widely used to obtain the layers of different materials. A possibility to obtain materials of the required composition (elementary, complex, composite, etc.) is determined by the chemical nature of a precursor. By now a set of criteria for the precursors to meet the MO CVD and PVD standards ...